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X-ray photoelectron spectroscopy (XPS) KRATOS Analytical AxisUltra

Instrument

X-ray photoelectron spectroscopy (XPS) is a non-destructive analytical technique in which x-rays bombard the surface of a material and the kinetic energy of the emitted electrons is measured. It is widely used to characterize the surfaces of various materials (inorganic compounds, organics, semiconductors, natural materials (lignocellulose) and synthetics (meso- and microporous ceramics). This technique analyzes the outer layer of materials (1 to 10 nm; 30 atomic layers) and allows the characterization of: 1) the chemical composition of material surfaces (element identification); 2) the relative abundance of these components on surfaces (semi-quantitative analysis) and; 3) the oxidation state of surface elements (precision depending on the quantity and complexity of the sample). All elements of the periodic table (Li to U) are detectable, with the exception of hydrogen and helium.

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KRATOS Analytical Axis-Ultra



Contact

Contact

Yi Dong, PhD


Tél: 418 656-2131 poste 412736

Courriel: microlab-xps@fsg.ulaval.ca

Booking

Sample preparation

Samples analyzed by XPS are solids (powders and films) including inorganic compounds, metal alloys, semiconductors, polymers, catalysts, glasses, ceramics, wood, biomaterials and many other materials.


Proper sample preparation is essential to prevent contamination of the surface to be analyzed. Generally, samples are analyzed “as is”, as any chemical treatment may leave residues that become a source of contamination.


Maximum sample size for XPS analysis is 20 mm x 70 mm and up to 5 mm thick.  Samples must be stable under ultra-high vacuum (< 10-9 Torr). Thicker samples can also be processed.

 

Please contact your instrument manager for further details concerning your analyses.

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